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Distributive Center of Metallographic Sample Preparation Consumables
Supply Chain of Metallographic Machines, Hardness Testers and Microscopes
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(86)-186-0049-7749
info@linkenergy.cn
2944149229
Distributive Center of Metallographic Sample Preparation Consumables
Supply Chain of Metallographic Machines, Hardness Testers and Microscopes
(86)-186-0049-7749
info@linkenergy.cn
2944149229
Hotline: (86)-186-0049-7749
E-mail: info@linkenergy.cn
QQ: 2944149229
Tel: (86-25)-8622-2679
Fax: (86-25)-8653-2679
Address: Room 711-498, No. 116, Suo Street, Jianye District, Nanjing China 210000
Leica fully manual upright material microscope - Leica DM3 XL inspection system, fast detection and response. In the inspection, process control, or defect and fault analysis of microelectronics and semiconductors, the detection speed is fast and the response speed is fast. The field of view is spacious by 30% and can quickly scan up to 6 "sample components. The DM3 XL inspection system, with its large field of view, can quickly identify defects and improve work efficiency.
The DM3 XL inspection system provides high quality for medium budget users and is an ideal inspection system for microelectronics and semiconductors.
Order Hotline：(86)-186-0049-7749
| Leica fully manual upright material microscope - Leica DM3 XL performance | ||
| • Fast detection, fast response, 30% spacious field of view, DM3 XL detection system can effectively save inspection time • Quickly scan a 6 "sample component with a magnification of 0.7X, and instantly capture a 35.7mm field of view with a macro objective lens • More details can be seen from the bottom of the eye, and areas that cannot be seen by conventional objective lenses are unobstructed under macro overview. Reliable detection of areas with insufficient development at the edge or center of the chip, uneven radial film thickness detection, and faster work • LED suitable for all phase contrast observation methods, providing constant color temperature, true color imaging, always seeing the same color sample, achieving reproducible results, LED service life up to 35000 hours, low energy consumption, and cost saving • Excellent optical properties, using oblique illumination to inspect the sides, edges, or debris, and illuminating the sample from different angles in a simple and effective way to achieve visualization of various morphologies. Using deep dark field contrast to detect small scratches or particles in the lower layers of the sample • Different samples - variable stage plugins with a wide variety of stage plugins to choose from, meeting the testing needs of samples of various sizes • Comfortable and intuitive work, ergonomic design, good comfort, and simpler operation | 
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| Leica fully manual upright material microscope - Leica DM3 XL technical parameters | ||
| system | Leica DM3 XL Technical Parameter | |
| Microscope bracket | Fixed metal bracket | |
| focus | 2-speed focusing (coarse/fine adjustment, using 1 μ M micrometer scale with top focusing limit device) or 3-speed focusing (coarse/fine adjustment, using 1 μ M and 4 μ M micrometer scale with top focusing limit device) Torque coarse focusing, adjustable stage height stop | |
| Stage stroke | 30mm | |
| incident light | Sturdy incident optical axis with 4-position reflector turntable | |
| Suitable for BF/DF/POL/DIC and FLUO: With oblique lighting Color coded aperture assist (CCDA) Variable aperture with central aperture With incident light filter cartridge (double filter, diameter 32mm) | ||
| The following light sources can adapt to all incident optical axes: LED light box with incident light intensity internal microscope blank parts Mirror room 106, suitable for synchronous adjustment of two light sources Fluorescent lighting SFL 100, 4000, and 7000 EL6000, Hg50, Hg100, Xe75 12V100W halogen light source (106 or 107/2 series light box) with independent transformer | ||
| Objective turntable/objective | 5-hole BF/DF M32, 6-hole BF M25 objective turntable: 5X, 10X, 20X high contrast flat field achromatic EPI objective lenses 2.5X-100X flat field achromatic EPI objective 1.25X-100X flat field semi apochromatic objective lens 0.7X macro 50X, 100X, 150X flat field apochromatic objective lens | |
| LED lighting | LED suitable for all phase contrast observation methods Realizing true color imaging at all brightness levels Free adjustment No need to replace bulbs - no downtime Replicable results | |
| stage | There are a variety of loading platform plugins to choose from, suitable for testing various types and sizes of samples: Platform size: 150x150mm Platform plug-in: metal plug-in, chip support or mask support Quick rough or precise stage positioning | |
| annex | Optional amplification regulator（1X、1.5X、2X） | |
| Optional measurement platform suitable for X, Y, and Z direction measurements | ||
| Transmitted light | Illumination with external cold light source with fiber optic | |
| power supply | Stable universal power supply unit，90-230V | |
Linkenergy Metallographic Equipments Nanjing Co., Ltd. Copyright
Filing Number：苏ICP备12038434号-1
Hotline: (86)-186-0049-7749 E-Mail: info@linkenergy.cn
Tel: (86-25)-8622-2679 Fax: (86-25)-8653-2679
Address: Room 711-498, No. 116, Suo Street, Jianye District, Nanjing China 210000
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