Leica Low Vacuum Coating Instrument - Leica EM ACE200-Leica EM Sample Preparation-Linkenergy Metallographic Equipments Nanjing Co., Ltd.

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Leica Low Vacuum Coating Instrument - Leica EM ACE200

Before scanning electron microscope observation, it is usually necessary to coat a layer of metal film on the surface of the sample to reduce the charge generated during observation, and strengthen the Secondary electrons or backscattered electron signal to obtain a higher signal to noise ratio.
Leica EM ACE200 is a low vacuum coating instrument that can choose between ion sputtering for metal film plating, carbon wire evaporation for carbon film plating, or both. It can meet daily SEM needs and can also be used for X-ray energy spectrum and spectral analysis, or TEM copper mesh coated with carbon film. Fully automatic computer control, automatically completing the entire process of vacuuming, coating, bleeding, etc., with one click operation. Adopting the currently popular touch screen control, it is simple and convenient.

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Leica Low Vacuum Coating Instrument - Leica EM ACE200 Performance
• Complete reproduction of results: Run automated processes and assist in parameter settings • Small and compact: compact design, small footprint, saving laboratory space • Easy to clean: Equipped with detachable doors, rolling shutters, internal shielding, light sources, and loading platforms • Easy to operate: intuitive touch screen and one click operation
Leica Low Vacuum Coating Instrument - Leica EM ACE200 Technical Parameters

	You can choose from ion sputtering mode, carbon wire evaporation carbon plating mode, or dual mode, Optional glow discharge (for hydrophilicization of grid surfaces)
	Specially designed pulse type carbon wire evaporation method, which can accurately control the thickness of carbon film
	Optional quartz film thickness detector for accurate control of coating thickness, with an accuracy of 0.1nm
	Fully automatic program control, automatically completing processes such as vacuum pumping, coating, and venting
	Touch screen control, simple and convenient
	vacuum degree ≤7x10-3mbar
	Sputtering current: 0-150mA adjustable
	Innovative design of square sample bin, size of sample bin: 140mm (width) x145mm (depth) x150mm (height)
	Working distance adjustment range：30-100mm